Titanium ( Ti ) sputtering targets are widely utilized in thin-film deposition processes due to their exceptional characteristics. Ti possesses a high resilience, excellent stability, and remarkable biocompatibility. These qualities make Ti sputtering targets ideal for a broad spectrum of applications in industries such as aerospace. Common applic

Gold sputtering targets are essential components in various thin-film deposition processes, owing to their exceptional attributes. These targets, often made of high-purity gold, are used in a sputtering system to generate an ionized plasma that deposits a thin layer of gold onto a substrate. The resulting gold films exhibit remarkable reflectivity,